Ion Source and Ion Implanter Filaments
Ion Source Filaments are integral components in semiconductor manufacturing equipment and scientific research applications. Typically these components are single helix cylindrical filaments, flat spiral filaments, or planar filaments. Designs vary greatly in such equipment, but Union City Filament is accustomed to recommending appropriate filament configurations and modifying specifications to suit equipment requirements and functionalities. The most common functional materials used to fabricate ion source filaments are tungsten, rhenium and iridium.
ION SOURCE FILAMENT PRODUCTS
Single Helix Filament with legs formed perpendicular to the coil axis. Most commonly used in X-Ray Tubes.
Single Helix Filament with legs formed perpendicular to the coil axis, 180 degrees apart. Most commonly used in Scientific Research Applications.
Single Helix Filament with legs formed parallel to the coil axis. Most commonly used in Mass Spectrometers.
Pigtail Filament with legs formed perpendicular to the coil axis. Most commonly used in Ion Implanters.
Pigtail Filament with legs formed parallel to the coil axis. Most commonly used in Ion Implanters.
Single Helix Flat Spiral Filament. Most commonly used in Scientific Research Applications.
Serpentine Planar Filament. Most commonly used in Ion Implanters and Scientific Instruments.
Modified Planar "Potato Masher" Filament. Most commonly used in Scientific Instruments and Vacuum Deposition Systems.